Validation (1) in CCP/GEC reactor.

Computational conditions

Validation (1) in CCP/GEC reactor.

Gas : Ar
Upper electrode : grounded

Comparison (1)
Lower electrode：
Vpp :200[V]
Frequency : 13.56[MHz]
Pressure : 13.33,33.33,66.67[Pa]

Comparison (2)
Lower electrode :
Vpp：100,200,300[V]
Frequency : 13.56[MHz]
Pressure : 13.33[Pa]

Referrence : D. P. Lymberopoulos and D. J. Economou,"Two-Dimensional Self-Consistent Radio Frequency Plasma Simulations Relevant to the Gaseous Electronics Conference RF Reference Cell", Journal of Research of the National Institute of Standards and Technology, Vol.100, No.4, 1995

Result

  • Comparison(1) : Electron density for each pressure

    Comparison(1) : Electron density for each pressure

  • Comparison(1) : Ionization rate for each pressure

    Comparison(1) : Ionization rate for each pressure

  • Comparison(1) : Radial electron density distribution

    Comparison(1) : Radial electron density distribution

  • Comparison (2) : Electron density for each voltage

    Comparison (2) : Electron density for each voltage

  • Comparison(2) : Ionization rate for each voltage

    Comparison(2) : Ionization rate for each voltage

  • Comparison (2) : Radial electron density distribution

    Comparison (2) : Radial electron density distribution