Verification of vacuum evaporation film thickness distribution

Computational conditions

• Evaporation material : Al
• Evaporation temperature : 1000K
• Evaporation flux : 1.8e17 /cm2/s
• Point and surface evaporation sources are compared.

Result

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  Flux distribution on substrate [#/m^2/s] Pressure [Pa] （log scale）

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  Theoretical value and calculation result of film thickness distibution