Magnetic field analysis in a magnetron sputtering device

Computational conditions

Magnetic field analysis in a magnetron sputtering device Parameters of magnets
  • Residual magnetic flux density Br 1.0T
  • Coercive force bHc 8500 Oe

Result

  • Lines of magnetic force

    Lines of magnetic force

  • Magnetic flux density

    Magnetic flux density

  • Horizontal componet of magnetic flux density

    Horizontal componet of magnetic flux density

  • Horizontal componet of magnetic flux density on target

    Horizontal componet of magnetic flux density on target

  • Vertical componet of magnetic flux density

    Vertical componet of magnetic flux density

  • Vertical componet of magnetic flux density on target

    Vertical componet of magnetic flux density on target